title: Survival and liquid holding recovery in UV-sensitive strains of Saccharomyces cerevisiae after treatment with chemical mutagens and radiation.
abstract: Two UV-sensitive mutants of Saccharomyces cerevisiae rad 3 and rad 6 were tested for sensitivity to X-rays, MMS, EMS, HNO2 and DEB. Rad 3 mutant is more sensitive than the wild type strain only to HNO2 and DEB, while rad 6 is cross sensitive both to X-rays and all chemicals tested. Liquid holding recovery (LHR) was studied by comparison of cell survival immediately after mutagen treatment and after 5 days of storage in phosphate buffer. LH greatly increases cell survival of rad 3 mutant after DEB and slightly after EMS, MMS and HNO2, while after UV treatment LH significantly decreases survival of this mutant. LH increases survival of rad 6 mutant after exposure to UV, MMS and HNO2, but decreases survival of DEB-treated cells. Exposure of wild type strain to LH results in an increase of survival after UV, and DEB but not after MMS and HNO2. The results suggest that LHR is a strain- and mutagen-specific phenomenon and cannot be explained within the present knowledge of repair processes in yeast.
mesh_terms: D000477:Alkylating Agents / Q000494:pharmacology; D002073:Butanes / Q000494:pharmacology; D004852:Epoxy Compounds / Q000494:pharmacology; D005020:Ethyl Methanesulfonate / Q000494:pharmacology; D008741:Methyl Methanesulfonate / Q000494:pharmacology; D009153:Mutagens / Q000494:pharmacology*; D009154:Mutation; D009608:Nitrous Acid / Q000494:pharmacology; D012441:Saccharomyces cerevisiae / Q000187:drug effects* / Q000528:radiation effects; D014466:Ultraviolet Rays; D014965:X-Rays
chemical_list: D000477:Alkylating Agents; D002073:Butanes; D004852:Epoxy Compounds; D009153:Mutagens; D005020:Ethyl Methanesulfonate; D008741:Methyl Methanesulfonate; D009608:Nitrous Acid