Photochemical synthesis of simple organic free radicals on simulated planteary surfaces-an ESR study.
Electron spin resonance spectroscopy provided evidence for formation of hydroxyl radicals during ultraviolet photolysis (254 nm) at -170C of H2O adsorbed on silica gel or of silica gel alone. The carboxyl radical was observed when CO or CO2 or a mixture of CO and CO2 absorbed on silica gel at -170C was irradiated. The ESR signals of these radicals slowly disappeared when the irradiated samples were warmed to room temperature. However, re-irradiation of CO or CO2, or the mixture CO and CO2 on silica gel at room temperature then produced a new species, the carbon dioxide anion radical, which slowly decayed and which was identical with that produced by direct photolysis of formic acid adsorbed on silica gel. The primary photochemical process may involve formation of hydrogen and hydroxyl radicals by means of (1) photodissociation of H2O physically adsorbed on the silica gel, or (2) absorption of the excitation energy by the silica gel surface with subsequent cleavage of the silanol bonds, or (3) dissociation of H2O molecules throug photosensitization by the surfaces or a combination of (1) to (3). Subsequent reactions of these radicals with adsorbed CO or CO2 or both yield carboxyl radicals, CO2H, the precsursors of formic acid. Our results confirm the formation of formic acid under simulated Martian conditions and provide a mechanistic basis for gauging the potential importance of gas-solid photochemistry for chemical evolution on other extraterrestrial bodies, on the primitive earth and on dust grains in the interstellar medium.
D000327:Adsorption; D002244:Carbon; D002245:Carbon Dioxide; D002248:Carbon Monoxide; D055598:Chemical Phenomena; D002621:Chemistry; D004578:Electron Spin Resonance Spectroscopy; D005118:Extraterrestrial Environment; D005561:Formates / Q000138:chemical synthesis; D005609:Free Radicals; D005782:Gels; D055593:Geological Phenomena; D005844:Geology; D010777:Photochemistry; D010782:Photolysis; D012822:Silicon Dioxide; D014466:Ultraviolet Rays; D014867:Water
D005561:Formates; D005609:Free Radicals; D005782:Gels; D014867:Water; D002245:Carbon Dioxide; D002244:Carbon; D012822:Silicon Dioxide; D002248:Carbon Monoxide