title: High resolution shadowing for electron microscopy by sputter deposition.
abstract: The sputtering process by an ion beam well collimated and highly accelerated provides a valuable means of high resolution shadowing, replication of a fine object by a combination of pre-shadowing and deposition as well as a preparation of supporting films. High resolution shadowing and films with grains smaller than 1 nm can be obtained by argon ion-sputtering targets of tungsten and tungsten/tantalum alloy. The resolution of carbon replicas pre-shadowed with tungsten/tantalum is determined from the radius of curvature of replicated magnesium oxide crystal corners.
mesh_terms: D000497:Alloys; D001128:Argon; D008854:Microscopy, Electron / Q000379:methods*; D013635:Tantalum; D014414:Tungsten
chemical_list: D000497:Alloys; D013635:Tantalum; D001128:Argon; D014414:Tungsten