title: Resin adhesion to the ground primary enamel: influence of etching times and thermal cycling test.
abstract: The purpose of this study was to investigate the influence of etching times and thermal cycling on resin adhesion on ground primary enamel. Two hundred bovine mandibular primary incisors were used. Materials used in this study were 40% phospholic acid gel, Photo Bond and Photo Clearfil A (Kuraray Co., Kurashiki, Japan) in PCA groups and 37% phospholic acid gel, Scotch Bond and Silux (3M Co., St. Paul, MN) in the Silux groups. The etching times were 0, 10, 20, 30 and 60 seconds. Shear bond strengths were tested. After the shear bond strength test, the test surfaces of the enamel and the resin specimens were observed using the SEM. The etching times that showed the highest bond strengths were 30 seconds both in the PCA non-thermal cycled group (80.10 +/- 13.01 MPa) and the PCA thermal cycled group (78.99 +/- 10.93 MPa), 20 seconds in the Silux non-thermal cycled group (76.77 +/- 12.99 MPa) and 60 seconds in the Silux thermal cycled group (63.61 +/- 19.64 MPa). The influence of thermal cycling test to the enamel-resin adhesion is relatively slight both in the PCA group and the Silux group.
authors.affiliation: Department of Pediatric Dentistry, Nagasaki University School of Dentistry, Japan.
authors.forename: Y
authors.initials: Y
authors.lastname: Hosoya
authors.forename: G
authors.initials: G
authors.lastname: Goto
mesh_terms: D000134:Acid Etching, Dental; D000268:Adhesiveness; D000818:Animals; D002417:Cattle; D003188:Composite Resins / Q000737:chemistry*; D001840:Dental Bonding; D003738:Dental Cements / Q000737:chemistry; D003743:Dental Enamel / Q000737:chemistry*; D017220:Dentin-Bonding Agents / Q000737:chemistry; D008855:Microscopy, Electron, Scanning; D019279:Resin Cements; D013718:Tensile Strength; D013997:Time Factors
chemical_list: D003188:Composite Resins; D003738:Dental Cements; D017220:Dentin-Bonding Agents; D019279:Resin Cements; C074046:Photo Clearfil A; C074741:Silux Plus; C041330:Scotchbond