title: [The effect of dispersed silicon dioxide--aerosil A-300--on the growth of Saccharomyces cerevisiae yeasts].
abstract: High-dispersed silicon dioxide--aerosil A-300 has been studied for its effect on the growth of yeast Saccharomyces cerevisiae. It is shown that at heterophase cultivation of these microorganisms under periodical conditions introduction of aerosil A-300 induces a decrease of the lag phase duration and an increase of the maximum specific growth rate and economic coefficient of the carbon substrate utilization. This high-dispersed material has exerted the similar effect under the conditions of chemostatic cultivation. Optimal parameters of this process are determined.
authors.forename: I K
authors.initials: IK
authors.lastname: Kurdish
authors.forename: V L
authors.initials: VL
authors.lastname: Bikhunov
authors.forename: E A
authors.initials: EA
authors.lastname: Tsimberg
authors.forename: S V
authors.initials: SV
authors.lastname: El'chits
authors.forename: E L
authors.initials: EL
authors.lastname: Vygovskaia
authors.forename: A A
authors.initials: AA
authors.lastname: Chuĭko
mesh_terms: D003470:Culture Media; D004305:Dose-Response Relationship, Drug; D012441:Saccharomyces cerevisiae / Q000187:drug effects* / Q000254:growth & development; D012822:Silicon Dioxide / Q000494:pharmacology*
chemical_list: D003470:Culture Media; D012822:Silicon Dioxide
vernacular_title: Vliianie dispersnogo dioksida kremniia--aérosila A-300 na rost drozhzheĭ Saccharomyces cerevisiae.