title: Toxicological investigations of waste products from the plasma etching process in the semiconductor industry.
authors.affiliation: Institute of Industrial Toxicology, Martin Luther University, Halle, Germany.
authors.forename: S
authors.initials: S
authors.lastname: Bauer
authors.forename: I
authors.initials: I
authors.lastname: Wolff
authors.forename: N
authors.initials: N
authors.lastname: Werner
authors.forename: P
authors.initials: P
authors.lastname: Hoffmann
authors.forename: R
authors.initials: R
authors.lastname: Hillig
authors.forename: R
authors.initials: R
authors.lastname: Voigt
authors.forename: B
authors.initials: B
authors.lastname: Merten
authors.forename: K
authors.initials: K
authors.lastname: Oemus
authors.forename: F W
authors.initials: FW
authors.lastname: Rath
mesh_terms: D000818:Animals; D001794:Blood Pressure / Q000187:drug effects; D001853:Bone Marrow / Q000187:drug effects / Q000648:ultrastructure; D002869:Chromosome Aberrations; D004331:Drosophila melanogaster; D005260:Female; D006339:Heart Rate / Q000187:drug effects; D007220:Industrial Waste / Q000009:adverse effects*; D007221:Industry; D008297:Male; D009153:Mutagens / Q000633:toxicity; D051381:Rats; D011919:Rats, Inbred Strains; D011995:Recombination, Genetic / Q000187:drug effects; D012306:Risk; D012666:Semiconductors
chemical_list: D007220:Industrial Waste; D009153:Mutagens