title: [Mechanism of NADH-sensitized formation of DNA breaks during irradiation with near UV light].
abstract: NADH-photosensitized in vitro formation of single-stranded breaks in plasmid DNA pBR322 depends on both the concentration of the sensitizer and the influence of near-UV radiation (320-400 nm). Scavengers and inhibitors of different activated oxygen species (sodium azide, sodium benzoate, catalase and superoxide dismutase) prevent the formation of breaks in full or partly. The data obtained show that hydroxyl radical (.OH) and singlet oxygen (1O2) are directly involved in the induction of breaks. In this process hydrogen peroxide (H2O2) plays the role of an intermediate in the reaction of .OH formation from superoxide anion-radical (O2-.) which is the first NAD.H-photogenerated product.
authors.forename: T G
authors.initials: TG
authors.lastname: Burchuladze
authors.forename: G Ia
authors.initials: GIa
authors.lastname: Fraĭkin
mesh_terms: D004249:DNA Damage / Q000528:radiation effects*; D004269:DNA, Bacterial / Q000528:radiation effects*; D004278:DNA, Superhelical / Q000528:radiation effects; D004587:Electrophoresis, Agar Gel; D004926:Escherichia coli / Q000378:metabolism; D005609:Free Radicals; D009243:NAD / Q000378:metabolism*; D010100:Oxygen / Q000378:metabolism; D010777:Photochemistry; D010957:Plasmids; D014466:Ultraviolet Rays
chemical_list: D004269:DNA, Bacterial; D004278:DNA, Superhelical; D005609:Free Radicals; D009243:NAD; D010100:Oxygen
vernacular_title: Izuchenie mekhanizma NADH-sensibiliziruemogo obrazovaniia razryvov v DNK pri obluchenii blizhnim UF-svetom.