Deep UV photochemistry of chemisorbed monolayers: patterned coplanar molecular assemblies.
Deep ultraviolet (UV) irradiation is shown to modify organosilane self-assembled monolayer (SAM) films by a photocleavage mechanism, which renders the surface amenable to further SAM modification. Patterned UV exposure creates alternating regions of intact SAM film and hydrophilic, reactive sites. The exposed regions can undergo a second chemisorption reaction to produce an assembly of SAMs in the same molecular plane with similar substrate attachment chemistry. The UV-patterned films are used as a template for selective buildup of fluorophores, metals, and biological cells.
Dulcey
C S
CS
Geo-Centers, Inc., Fort Washington, MD 20744.
Georger
J H
JH
Krauthamer
V
V
Stenger
D A
DA
Fare
T L
TL
Calvert
J M
JM
D001369:Axons / Q000502:physiology / Q000528:radiation effects*; D002448:Cell Adhesion / Q000528:radiation effects; D002460:Cell Line; D002470:Cell Survival / Q000528:radiation effects; D006801:Humans; D009447:Neuroblastoma; D010777:Photochemistry; D014466:Ultraviolet Rays