title: Deep UV photochemistry of chemisorbed monolayers: patterned coplanar molecular assemblies.
abstract: Deep ultraviolet (UV) irradiation is shown to modify organosilane self-assembled monolayer (SAM) films by a photocleavage mechanism, which renders the surface amenable to further SAM modification. Patterned UV exposure creates alternating regions of intact SAM film and hydrophilic, reactive sites. The exposed regions can undergo a second chemisorption reaction to produce an assembly of SAMs in the same molecular plane with similar substrate attachment chemistry. The UV-patterned films are used as a template for selective buildup of fluorophores, metals, and biological cells.
authors.affiliation: Geo-Centers, Inc., Fort Washington, MD 20744.
authors.forename: C S
authors.initials: CS
authors.lastname: Dulcey
authors.forename: J H
authors.initials: JH
authors.lastname: Georger
authors.forename: V
authors.initials: V
authors.lastname: Krauthamer
authors.forename: D A
authors.initials: DA
authors.lastname: Stenger
authors.forename: T L
authors.initials: TL
authors.lastname: Fare
authors.forename: J M
authors.initials: JM
authors.lastname: Calvert
mesh_terms: D001369:Axons / Q000502:physiology / Q000528:radiation effects*; D002448:Cell Adhesion / Q000528:radiation effects; D002460:Cell Line; D002470:Cell Survival / Q000528:radiation effects; D006801:Humans; D009447:Neuroblastoma; D010777:Photochemistry; D014466:Ultraviolet Rays