title: [New acrylic resins with very low residual monomer].
abstract: New experimental acrylic resins were prepared by polymerization of MMA in the presence of vinylidene fluoride/hexafluoropropylene copolymer. The amount of residual monomer in the resins prepared by visible light curing, cold curing, and heat curing, at various polymer/monomer ratios, was measured and compared with the usual MMA/PMMA resin. In the visible light cured resins containing 60 or 70 wt% of the fluoropolymer, the amount of residual monomer was less than 0.1%. In the cold cured resins, the amount of residual monomer was very low: 0.2% and 0.7% for the resins containing 70 and 60 wt% of the polymer, respectively. These values were comparable to the usual heat cured MMA/PMMA resins. In the heat cured resins, the amount of residual monomer was the lowest; less than 0.1%, even in the resin consisting of 50 wt% polymer. Thus, we prepared new acrylic resins with much less residual monomer than the usual MMA/PMMA resins.
authors.forename: Y
authors.initials: Y
authors.lastname: Ohe
authors.forename: Y
authors.initials: Y
authors.lastname: Kadoma
authors.forename: Y
authors.initials: Y
authors.lastname: Imai
mesh_terms: D000180:Acrylic Resins / Q000138:chemical synthesis*; D005459:Fluorides / Q000737:chemistry; D011126:Polypropylenes / Q000737:chemistry; D014753:Vinyl Compounds / Q000737:chemistry
chemical_list: D000180:Acrylic Resins; D011126:Polypropylenes; D014753:Vinyl Compounds; C007384:1,1-difluoroethylene; D005459:Fluorides