Radical-induced degradation of organic halogen and sulfur compounds in oxygenated aqueous solutions.
Asmus
K D
KD
Hahn-Meitner-Institut Berlin, Bereich Strahlenchemie, Federal Republic of Germany.
Lal
M
M
Mönig
J
J
Schöneich
C
C
D055598:Chemical Phenomena; D002621:Chemistry; D005609:Free Radicals; D006846:Hydrocarbons, Halogenated; D012996:Solutions; D013438:Sulfhydryl Compounds; D014867:Water
D005609:Free Radicals; D006846:Hydrocarbons, Halogenated; D012996:Solutions; D013438:Sulfhydryl Compounds; D014867:Water