title: Photoactive chemicals used in photoresist systems.
abstract: Among the most significant advances in the manufacture of microelectronic devices have been chemical changes in photoresist materials and processes. These materials should be handled with great care in the workplace. Careful medical surveillance of employees who regularly handle photoresist materials is appropriate in view of the very limited biologic information available.
authors.forename: D T
authors.initials: DT
authors.lastname: Teitelbaum
mesh_terms: D000181:Acrylonitrile / Q000633:toxicity; D006801:Humans; D006838:Hydrocarbons / Q000633:toxicity; D008027:Light; D010781:Photography; D011142:Polyvinyl Alcohol / Q000633:toxicity; D012666:Semiconductors; D012995:Solubility
chemical_list: D006838:Hydrocarbons; C006647:asphalt; D011142:Polyvinyl Alcohol; D000181:Acrylonitrile