title: Contrast effects in photoelectron microscopy; UV dose-dependent quantum yields of biological surface components.
abstract: The relative brightness of photoelectron microscopy images as a function of exposure to UV light has been determined from model systems representative of biological cell surface components. Quantitative data for amino acid homopolymers, yields. The photoelectron quantum yields, increase substantially over the initial values. For example, the quantum yields fo poly-L-tyrosine at 200 nm is initially about 5 X 10(-8) electron/incident photon. The quantum yield increases with 254 nm irradiation, leveling off at about 5 X 10(-4) electrons/incident photon after a dose of 3 X 10(21) quanta cm-2. Pre-irradiation of poly-L-tyrosine in the presence of certain chemical agents, for example, the Lewis base diborane (B2H6), results in a substantial reduction of the dose-dependent increase in quantum yield. Exposure to the reducing agent stannane (SnH4) essentially eliminates the effect. These chemical treatments provide methods of controlling the UV dose-dependent effects in the photoelectron images.
mesh_terms: D000596:Amino Acids / Q000528:radiation effects; D001894:Borohydrides / Q000528:radiation effects; D004307:Dose-Response Relationship, Radiation; D005362:Ficoll / Q000528:radiation effects; D008854:Microscopy, Electron / Q000379:methods*; D008954:Models, Biological; D011663:Pulmonary Surfactants / Q000528:radiation effects; D014001:Tin / Q000528:radiation effects; D017971:Tin Compounds; D014466:Ultraviolet Rays
chemical_list: D000596:Amino Acids; D001894:Borohydrides; D011663:Pulmonary Surfactants; D017971:Tin Compounds; C031525:stannane; D005362:Ficoll; D014001:Tin; C024731:diborane