title: Scanning electron microscopic study and shear bond strength measurement with 5% and 37% phosphoric acid.
abstract: Direct bonding of orthodontic attachments has become a clinical reality with the application of the acid etch technique, using 37% phosphoric acid. The objective of this study was to detect the etch pattern with scanning electron microscopy and the shear bond strength with a Hounsefield tensometer (Nene Instruments Ltd., Northampton, England) by using 37% and 5% phosphoric acid (H3PO4). It was observed that with 5% H3PO4 there was minimal enamel loss compared with 37% H3PO4. There was no significant difference in shear bond strength, when enamel surface was etched with 5% H3PO4 and 37% H3PO4.
authors.affiliation: Government Dental College and Hospital, Nagpur, India.
authors.forename: W A
authors.initials: WA
authors.lastname: Bhad
authors.forename: P V
authors.initials: PV
authors.lastname: Hazarey
mesh_terms: D000134:Acid Etching, Dental; D000293:Adolescent; D001641:Bicuspid; D017438:Bisphenol A-Glycidyl Methacrylate / Q000737:chemistry; D001840:Dental Bonding; D003743:Dental Enamel / Q000648:ultrastructure; D006801:Humans; D008855:Microscopy, Electron, Scanning; D016910:Orthodontic Brackets; D010756:Phosphoric Acids / Q000008:administration & dosage*; D013314:Stress, Mechanical; D013499:Surface Properties; D013718:Tensile Strength
chemical_list: D010756:Phosphoric Acids; D017438:Bisphenol A-Glycidyl Methacrylate