title: Fabrication of submicrometer features on curved substrates by microcontact printing.
abstract: Microcontact printing (mu CP) has been used to produce patterned self-assembled monolayers (SAMs) with submicrometer features on curved substrates with radii of curvature as small as 25 micrometers. Wet-chemical etching that uses the patterned SAMs as resists transfers the patterns formed by mu CP into gold. At present, there is no comparable method for microfabrication on curved surfaces.
authors.affiliation: Department of Chemistry, Harvard University, Cambridge, MA 02138, USA.
authors.forename: R J
authors.initials: RJ
authors.lastname: Jackman
authors.forename: J L
authors.initials: JL
authors.lastname: Wilbur
authors.forename: G M
authors.initials: GM
authors.lastname: Whitesides
mesh_terms: D002627:Chemistry, Physical / Q000379:methods*; D004129:Dimethylpolysiloxanes / Q000737:chemistry*; D006046:Gold / Q000737:chemistry*; D012828:Silicones / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D004129:Dimethylpolysiloxanes; D012828:Silicones; C013830:baysilon; D006046:Gold