Osmium conductive metal coating for SEM specimen using sublimated osmium tetroxide in negative glow phase of DC glow discharge.
A new method of osmium conductive metal coating for scanning electron microscopy specimens using osmium tetroxide in direct current glow discharge and its apparatus have been devised. Anode and cathode plates are placed in a gas reactor, sublimated osmium tetroxide is introduced, and glow discharge is generated. As a result, the gas between the electrodes instantaneously becomes plasma. At the specimen surface, which is placed in the negative glow phase on the cathode plate, positively ionized osmium molecules are directly adhered and deposited, thereby leaving a completely amorphous metal coating of osmium. As a result, the formed coating precisely matched the fine structure of the specimen surface, and even when irradiated with a strong electron beam was free of heat damage, electrification and contamination. The secondary electron emission efficiency of the coating was also good. Furthermore, no granularity of the film surface was observed even when viewed at a high magnification. In this way, a superior osmium conductive metal coating was obtained.
Tanaka
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A
Nippon Laser and Electronics Laboratory, Nagoya, Japan.
D004912:Erythrocytes / Q000648:ultrastructure; D006801:Humans; D008855:Microscopy, Electron, Scanning / Q000379:methods*; D009993:Osmium Tetroxide; D013057:Spectrum Analysis
D009993:Osmium Tetroxide