title: A model for assessing occupational exposure to extremely low-frequency magnetic fields in fabrication rooms in the Semiconductor Health Study.
abstract: A model was created to assess occupational exposure to extremely low-frequency magnetic fields (ELF-MF) among semiconductor fabrication-room (fab) workers. This model was based on the assumption that each subject's exposure arose from being near identifiable ELF-MF sources or being in areas with high ELF-MF levels. To assess ELF-MF exposures, the model superimposed subjects' time-activity patterns (patterns of how and where they spent their time) with measurements of magnetic-field levels from devices and work areas. This model, which was validated by personal dosimetry on 192 persons in three fabs, predicted actual time-weighted average exposures with a correlation coefficient of 0.62. The inability of the model to predict individual exposures more accurately was attributed to unforseen sources of elevated ELF-MF (transformers, distribution panels, sources in adjacent rooms) or to errors in subjects' judgments of time spent near devices. These unpredictable errors are intrinsic to the method used to estimate exposure.
authors.affiliation: Department of Family and Community Medicine, University of Massachusetts Medical Center, Worcester 01655, USA.
authors.forename: S
authors.initials: S
authors.lastname: Abdollahzadeh
authors.forename: S K
authors.initials: SK
authors.lastname: Hammond
authors.forename: M B
authors.initials: MB
authors.lastname: Schenker
mesh_terms: D004574:Electromagnetic Fields; D004812:Epidemiologic Methods; D006801:Humans; D008962:Models, Theoretical; D016273:Occupational Exposure; D012666:Semiconductors