Photopolymerization of Acrylate Films under an Imposed Spatial Irradiation: Thermodynamics of Relief Self-Development
UV irradiation through a lined mask of acrylate-based self-developing materials leads to the formation of a relief in the irradiated areas. Investigation of the effect of various properties, through a known two-layer model, showed the paramount importance of surface state on relief height. Both relief height and inhibition time of the growing kinetics are shown to be directly dependent on two surface properties: surface free energy and viscosity of the condensed state of the gaseous atmosphere adjoining the film.
Lavielle
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Laboratoire de Photochimie Generale, URA CNRS No. 431, Ecole Nationale Superieure de Chimie de Mulhouse, 3 rue Alfred Werner, Mulhouse Cedex, 68093, France
Croutxe-Barghorn
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Schuller
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Lougnot
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