title: Direct Observation of Foam Film Rupture by Several Types of Antifoams Using a Scanning Laser Microscope.
abstract: It is well known that the stability of a pseudoemulsion film, a thin liquid film formed between an antifoam particle and air, can be important during defoaming action. We have compared the bursting behavior of a two-dimensional thin liquid film from an aqueous surfactant solution on a glass plate, in which six types of antifoam particles have been dispersed, using laser microscopic techniques. The used antifoams were a silicone oil, a mixed-type antifoam (mixture of silicone oil and hydrophobic solid particles), a hydrophobic silica, and a silicone-based solid antifoam (prepared by interfacial polymerization with oil and water). The antifoaming performance of these six types of antifoams, measured by the glass cylinder shaking test, was in the order: the mixed-type antifoam >== the silicone-based solid antifoam > the hydrophobic silica >== the silicone oil. Pseudoemulsion film rupture was observed at the film thickness less than 0.1 µm for both the silocone oil and the hydrophobic silica. In the case of particles with rough edges (the silicone-based antifoam), pseudoemulsion film on the top of the particles can be easily ruptured at a convex part of the solid surface. Furthermore, solid particles existing on the surface of an oil droplet in the mixed-type antifoams form marked projections and these projections give rise to distortion of the thinning film. As soon as the distortion of the thinning film took place on the top of the antifoam droplet, the pseudoemulsion film can be instantaneously ruptured. Referring to the antifoaming mechanisms for mixed-type antifoams, both steps from the pseudoemulsion film formation to the lens formation and from the counter pseudoemulsion film formation to the bridge formation would be very fast and cause a very high antifoaming efficiency. Copyright 1999 Academic Press.
authors: Material Science Research Center, Lion Corporation, 7-13-12, Hirai, Edogawa-ku, Tokyo, 132, Japan
authors: T
authors: Tamura
authors: M
authors: Kageyama
authors: Y
authors: Kaneko
authors: T
authors: Kishino
authors: M
authors: Nikaido