EPR characterization of free radical intermediates formed during ultrasound exposure of cell culture media.
Free radicals and/or hydrogen peroxide produced by exposure of cells to ultrasound are potentially cytotoxic and mutagenic. The formation and type of free radical species can be substantially modulated by the chemical composition of the media in which the ultrasound exposures of cells are carried out. In the current study, we examined the free radical intermediates formed during ultrasound exposure of a typical cell culture medium (RPMI-1640); the dominant free radicals that were identified by spin trapping were derived from the hydrophobic amino acids Trp, Leu, and Phe, and were formed by hydrogen abstraction from these amino acids. Compared to exposures in phosphate-buffered saline, the yield of *OH radicals and H2O2 was significantly reduced in the cell culture medium, glucose (the main organic component in the medium), and the hydrophobic amino acids (Trp, Phe, Tyr, Leu, Val, Met) being chiefly responsible for this effect. In contrast, other nonhydrophobic amino acids did not contribute significantly to the *OH or H2O2 decrease. These findings are consistent with the accumulation of hydrophobic solutes at the liquid-gas interface of the collapsing cavitation bubbles resulting in increased efficiency of radical scavenging.
Misík
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V
Radiation Biology Branch, National Cancer Institute, National Institutes of Health, Bethesda, MD 20892-1002, USA.
Riesz
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P
D000596:Amino Acids / Q000737:chemistry*; D001557:Benzenesulfonates; D002151:Calorimetry; D003470:Culture Media / Q000737:chemistry / Q000528:radiation effects*; D003497:Cyclic N-Oxides; D004578:Electron Spin Resonance Spectroscopy / Q000379:methods; D005561:Formates / Q000737:chemistry; D005609:Free Radicals / Q000032:analysis; D017665:Hydroxyl Radical / Q000032:analysis*; D008956:Models, Chemical; D009603:Nitroso Compounds; D010782:Photolysis; D013113:Spin Labels; D014465:Ultrasonics
D000596:Amino Acids; D001557:Benzenesulfonates; D003470:Culture Media; D003497:Cyclic N-Oxides; D005561:Formates; D005609:Free Radicals; D009603:Nitroso Compounds; D013113:Spin Labels; C030544:formic acid; D017665:Hydroxyl Radical; C017245:5,5-dimethyl-1-pyrroline-1-oxide; C048757:3,5-dibromo-4-nitrosobenzenesulfonate