title: Adsorption Behavior of Cationic and Nonionic Surfactant Mixtures at the Alumina-Water Interface.
abstract: The solution and interfacial behavior of surfactant mixtures was investigated using a cationic surfactant, tetradecyl trimethyl ammonium chloride (TTAC), and a nonionic surfactant, pentadecylethoxylated nonyl phenol (NP-15), with alumina as the substrate. The cationic TTAC adsorbed at the alumina-water interface as a result of electrostatic attraction at pH approximately 10 whereas the nonionic NP-15 did not. Interestingly, in the mixed surfactant system, the tetradecyl trimethyl ammonium chloride forced adsorption of the NP-15 as a result of hydrophobic interactions between the adsorbed surfactant chains at the alumina-water interface. The adsorption behavior was dependent upon the ratio of the two surfactants in the mixture as well as the order of addition. With an increase in TTAC content, the adsorption density of NP-15 increased and the isotherm shifted to lower surfactant concentrations. The adsorption of TTAC decreased under conditions of saturation adsorption due to the bulkiness of the coadsorbed NP-15 as well as competition for common adsorption sites. However, below saturation adsorption conditions, the adsorption of TTAC was increased due to synergistic interactions between the cationic and nonionic heads leading to reduced repulsion among the cationic headgroups. Zeta potential measurements showed that, with an increase of NP-15 in the mixtures, the positive charge of the TTAC was partially screened by the coadsorbed NP-15. Surface tension of the surfactant mixtures was also measured, and regular solution theory was used to model the interactions between the surfactants. Monomer concentrations obtained using the theory were correlated with the adsorption tendencies and it was seen that TTAC adsorption corresponded with its monomer concentration but that of NP-15 did not, suggesting the need for adequate theories for interactions between surfactants.
authors.affiliation: Langmuir Center for Colloids and Interfaces, Columbia University, New York, New York, 10027
authors.initials: L
authors.lastname: Huang
authors.initials: C
authors.lastname: Maltesh
authors.initials: P
authors.lastname: Somasundaran