Extended random sequential adsorption model of irreversible deposition processes: from simulations to experiments.
An experimental study of the irreversible deposition of colloidal particles of various radii R on a solid surface is presented over a wide range of the Péclet number, Pe, or reduced radius R* (Pe = R*(4)). The experimental data are analyzed by means of a new generalized random sequential adsorption model that takes explicitly the diffusion of the particles during the deposition into account. It allows description of the continuous transition from a random sequential adsorption-like to a ballistic-like deposition behavior. It depends on three parameters: d(s), related to the diffusion of the particles before adhesion; n(s), related to the number of allowed adhesion trials of a particle; and R(e), representing the effective particle radius. The model allows accounting for all of the experimental observations relative to the radial distribution functions and the number density fluctuations over the whole coverage range and all investigated values of R*. In addition, it is found that d(s)/R is proportional to R*(-2) as expected for a diffusional process. Moreover, the parameters d(s) and n(s) appear to be connected through the empirical relation (d(s)/R)n(s)(2/3) = C, where C is found to be of the order of 50. This unique statistical model allows an accurate description of the irreversible deposition process, whatever the influence of gravity with respect to diffusion.
Lavalle
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P
Institut National de la Santé et de la Recherche Médicale, Unité 424, Fédération de Recherche "Odontologie," Université Louis Pasteur, 11, rue Humann, 67085 Strasbourg Cedex, France.
Schaaf
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P
Ostafin
M
M
Voegel
J C
JC
Senger
B
B