The Effect of Electromagnetic Retardation on the Rupture Process of a Very Thin Liquid Film.
Effects of electromagnetic retardation on the rupture process of a very thin liquid film coated on a flat plate are studied. The analysis results indicate that the electromagnetic retardation effect (D) for the case A > 0 (attraction) is a stabilization factor, which prolongs the rupture time. The wavenumber of the most unstable mode is decreasing as D increases. It is also found that the linear solution of rupture time T(LM) is larger than the nonlinear rupture time T(NM), but the gradient of T(LM) to D is comparable to that of T(NM). Copyright 1999 Academic Press.
Hwang
CC
Department of Engineering Science, National Cheng Kung University, Tainan, Taiwan, 70101, Republic of China
Ke
TC
Lin
CK
Shiau
CW