title: Thin sol-gel-derived silica coatings on dental pure titanium casting.
abstract: The sol-gel dipping process, in which liquid silicon alkoxide is transformed into a solid silicon-oxygen network, can produce a thin film coating of silica (SiO(2)). The features of this method are high homogeneity and purity of the thin SiO(2) film and a low sinter temperature, which are important in the preparation of coating films that can protect metallic ion release from the metal substrate and prevent attachment of dental plaque. We evaluated the surface properties of dental pure titanium casting coated with a thin SiO(2) or SiO(2)/F-hybrid film by the sol-gel dipping process. The metal specimens were pretreated by dipping in isopropylalcohol solution containing 10 wt% 3-aminopropyl trimethoxysilane and treated by dipping in the silica precursor solution for 5 min, withdrawal at a speed of 2 mm/min, air-drying for 20 min at room temperature, heating at 120 degrees C for 20 min, and then storing at room temperature. Both SiO(2) and SiO(2)/F films bonded strongly (above 55 MPa) to pure titanium substrate by a tensile test. SiO(2(-)) and SiO(2)/F-coated specimens immersed in 1 wt% of lactic acid solution for two weeks showed significantly less release of titanium ions (30. 5 ppb/cm(2) and 9.5 ppb/cm(2), respectively) from the substrate than noncoated specimens (235.2 ppb/cm(2)). Hydrophobilization of SiO(2(-)) and SiO(2)/F-coated surfaces resulted in significant increases of contact angle of water (81.6 degrees and 105.7 degrees, respectively) compared with noncoated metal specimens (62.1 degrees ). The formation of both thin SiO(2) and SiO(2)/F-hybrid films by the sol-gel dipping process on the surface of dental pure titanium casting may be useful clinically in enhancing the bond strength of dental resin cements to titanium, preventing titanium ions release from the substrate, and reducing the accumulation of dental plaque attaching to intraoral dental restorations.
authors.affiliation: Department of Fixed Prosthodontics, Nagasaki University School of Dentistry, Nagasaki, Japan. keichi@net.nagasaki-u.ac.jp
authors.forename: K
authors.initials: K
authors.lastname: Yoshida
authors.forename: K
authors.initials: K
authors.lastname: Kamada
authors.forename: K
authors.initials: K
authors.lastname: Sato
authors.forename: R
authors.initials: R
authors.lastname: Hatada
authors.forename: K
authors.initials: K
authors.lastname: Baba
authors.forename: M
authors.initials: M
authors.lastname: Atsuta
mesh_terms: D000268:Adhesiveness; D001128:Argon; D020099:Coated Materials, Biocompatible / Q000737:chemistry*; D003735:Dental Casting Technique; D004602:Elements; D012822:Silicon Dioxide / Q000737:chemistry*; D014025:Titanium / Q000737:chemistry*; D014867:Water
chemical_list: D020099:Coated Materials, Biocompatible; D004602:Elements; D014867:Water; D001128:Argon; D012822:Silicon Dioxide; D014025:Titanium