High resolution transmission electron microscopy to study very thin crystalline layers buried at an amorphous-crystalline interface
Structure characterisation of interfaces is a field of widespread application of high resolution transmission electron microscopy for its very high spatial resolution. Specimen thickness and electron optical condition have a deep influence on the high resolution electron transmission microscopy image contrast. Hence, in many cases, the real structure of the sample can be understood from experimental images only by comparison with the relevant simulation. Moreover, the understanding of the contrast variation of a few A at an interface is a task in which even the use of simulation could not produce an unequivocal solution of the experimental result. In this paper high resolution transmission electron microscopy image simulations show that two monolayers of crystalline material buried at an amorphous-crystalline interface can be successfully revealed and interpreted. The simulated images reproduce the experimental results as obtained from the Al/Si-As/n-GaAs (001) heterostructure.
Re
M
Centro Nazionale Ricerca e Sviluppo Materiali (PA.S.T.I.S.-C.N.R.S.M.), Brindisi, Italy.
Carlino
E
Sorba
L
Franciosi
A
Muller
BH