Combined action of redox potential and pH on heat resistance and growth recovery of sublethally heat-damaged Escherichia coli.
The combined effect of redox potential (RP) (from -200 to 500 mV) and pH (from 5.0 to 7.0) on the heat resistance and growth recovery after heat treatment of Escherichia coli was tested. The effect of RP on heat resistance was very different depending on the pH. At pH 6.0, there was no significant difference, whereas at pH 5.0 and 7.0 maximum resistance was found in oxidizing conditions while it fell in reducing ones. In sub-lethally heat-damaged cells, low reducing and acid conditions allowed growth ability to be rapidly regained, but a decrease in the redox potential and pH brought about a longer lag phase and a slower exponential growth rate, and even led to growth failure (pH 5.0, < or =-100 mV).
Riondet
C
C
Laboratoire de Microbiologie UA INRA, ENSBANA, Université de Bourgogne, Dijon, France.
Cachon
R
R
Waché
Y
Y
Sunyol i Bert
E
E
Gbaguidi
P
P
Alcaraz
G
G
Diviès
C
C
D003470:Culture Media; D004926:Escherichia coli / Q000254:growth & development*; D006358:Hot Temperature; D006863:Hydrogen-Ion Concentration; D010084:Oxidation-Reduction
D003470:Culture Media