Mechanism of the Photodissociation of 4-Diphenyl(trimethylsilyl)methyl-N,N-dimethylaniline.
On irradiation in hexane (248- and 308-nm laser light) 4-diphenyl(trimethylsilyl)methyl-N,N-dimethylaniline, 2, undergoes photodissociation of the C-Si bond giving 4-N,N-dimethylamino-triphenylmethyl radical, 3(*) (lambda(max) at 343 and 403 nm), in very high quantum yield (Phi = 0.92). The intervention of the triplet state of 2 (lambda(max) at 515 nm) is clearly demonstrated through quenching experiments with 2,3-dimethylbuta-1,3-diene, styrene, and methyl methacrylate using nanosecond laser flash photolysis (LFP). The formation of 3(*) is further demonstrated using EPR spectroscopy. The detection of the S(1) state of 2 was achieved using 266-nm picosecond LFP, and its lifetime was found to be 1400 ps, in agreement with the fluorescence lifetime (tau(f) = 1500 ps, Phi(f) = 0.085). The S(1) state is converted almost exclusively to the T(1) state (Phi(T) = 0.92). In polar solvents such as MeCN, 2 undergoes (1) photoionization to its radical cation 2(*)(+), and (2) photodissociation of the C-Si bond, giving radical 3(*) as before in hexane. The formation of 2(*)(+) occurs through a two-photon process. Radical cation 2(*)(+) does not fragment further, as would be expected, to 3(*) via a nucleophile(MeCN)-assisted C-Si bond cleavage but regenerates the parent compound 2. Obviously, the bulkiness of the triphenylmethyl group prevents interaction of 2(*)(+) with the solvent (MeCN) and transfer to it of the electrofugal group Me(3)Si(+). The above results of the laser flash photolysis are supported by pulse radiolysis, fluorescence measurements, and product analysis.
Tasis
DA
Department of Chemistry, University of Ioannina, 451 10 Ioannina, Greece, Max-Planck-Institut für Strahlenchemie, 45470 Mülheim, Germany, and( )()N.C.S.R, "Democritos", 15310 Aghia Paraskevi, Attiki, Greece.
Siskos
MG
Zarkadis
AK
Steenken
S
Pistolis
G