Nanofabrication of self-assembled monolayers using scanning probe lithography.
This Account focuses on our recent and systematic effort in the development of generic scanning probe lithography (SPL)-based methodologies to produce nanopatterns of self-assembled monolayers (SAMs). The key to achieving high spatial precision is to keep the tip-surface interactions strong and local. The approaches used include two AFM-based methods, nanoshaving and nanografting, which rely on the local force, and two STM-based techniques, electron-induced diffusion and desorption, which use tunneling electrons for fabrication. In this Account we discuss the principle of these procedures and the critical steps in controlling local tip-surface interactions. The advantages of SPL will be illustrated through various examples of production and modification of SAM nanopatterns and their potential applications.
Department of Chemistry, Wayne State University, Detroit, Michigan 48202, USA.
G Y
GY
Liu
S
S
Xu
Y
Y
Qian
D002621:Chemistry / Q000379:methods*; D004583:Electrons; D005544:Forecasting; D018625:Microscopy, Atomic Force / Q000379:methods; D016252:Microscopy, Scanning Tunneling; D011506:Proteins / Q000737:chemistry; D013499:Surface Properties; D020711:Threshold Limit Values
D011506:Proteins