Nanofabrication of self-assembled monolayers using scanning probe lithography.
This Account focuses on our recent and systematic effort in the development of generic scanning probe lithography (SPL)-based methodologies to produce nanopatterns of self-assembled monolayers (SAMs). The key to achieving high spatial precision is to keep the tip-surface interactions strong and local. The approaches used include two AFM-based methods, nanoshaving and nanografting, which rely on the local force, and two STM-based techniques, electron-induced diffusion and desorption, which use tunneling electrons for fabrication. In this Account we discuss the principle of these procedures and the critical steps in controlling local tip-surface interactions. The advantages of SPL will be illustrated through various examples of production and modification of SAM nanopatterns and their potential applications.
Liu
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Department of Chemistry, Wayne State University, Detroit, Michigan 48202, USA.
Xu
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Qian
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D002621:Chemistry / Q000379:methods*; D004583:Electrons; D005544:Forecasting; D018625:Microscopy, Atomic Force / Q000379:methods; D016252:Microscopy, Scanning Tunneling; D011506:Proteins / Q000737:chemistry; D013499:Surface Properties; D020711:Threshold Limit Values
D011506:Proteins