Optically defined multifunctional patterning of photosensitive thin-film silica mesophases.
Photosensitive films incorporating molecular photoacid generators compartmentalized within a silica-surfactant mesophase were prepared by an evaporation-induced self-assembly process. Ultraviolet exposure promoted localized acid-catalyzed siloxane condensation, which can be used for selective etching of unexposed regions; for "gray-scale" patterning of refractive index, pore size, surface area, and wetting behavior; and for optically defining a mesophase transformation (from hexagonal to tetragonal) within the film. The ability to optically define and continuously control both structure and function on the macro- and mesoscales is of interest for sensor arrays, nanoreactors, photonic and fluidic devices, and low-dielectric-constant films.
Doshi
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DA
Department of Chemical and Nuclear Engineering and Center for Micro-Engineered Materials, Advanced Materials Laboratory, University of New Mexico, 1001 University Boulevard SE, Albuquerque, NM 87106, USA.
Huesing
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NK
Lu
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M
Fan
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H
Lu
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Y
Simmons-Potter
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K
Potter
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Hurd
A J
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Brinker
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CJ