title: Optically defined multifunctional patterning of photosensitive thin-film silica mesophases.
abstract: Photosensitive films incorporating molecular photoacid generators compartmentalized within a silica-surfactant mesophase were prepared by an evaporation-induced self-assembly process. Ultraviolet exposure promoted localized acid-catalyzed siloxane condensation, which can be used for selective etching of unexposed regions; for "gray-scale" patterning of refractive index, pore size, surface area, and wetting behavior; and for optically defining a mesophase transformation (from hexagonal to tetragonal) within the film. The ability to optically define and continuously control both structure and function on the macro- and mesoscales is of interest for sensor arrays, nanoreactors, photonic and fluidic devices, and low-dielectric-constant films.
authors.affiliation: Department of Chemical and Nuclear Engineering and Center for Micro-Engineered Materials, Advanced Materials Laboratory, University of New Mexico, 1001 University Boulevard SE, Albuquerque, NM 87106, USA.
authors.forename: D A
authors.initials: DA
authors.lastname: Doshi
authors.forename: N K
authors.initials: NK
authors.lastname: Huesing
authors.forename: M
authors.initials: M
authors.lastname: Lu
authors.forename: H
authors.initials: H
authors.lastname: Fan
authors.forename: Y
authors.initials: Y
authors.lastname: Lu
authors.forename: K
authors.initials: K
authors.lastname: Simmons-Potter
authors.forename: B G
authors.initials: BG
authors.lastname: Potter
authors.forename: A J
authors.initials: AJ
authors.lastname: Hurd
authors.forename: C J
authors.initials: CJ
authors.lastname: Brinker