title: Lattice location and stability of ion implanted Cu in Si
abstract: We report on the lattice location of ion implanted Cu in Si using the emission channeling technique. The angular distribution of beta(-) particles emitted by the radioactive isotope 67Cu was monitored following room temperature implantation into Si single crystals and annealing up to 600 degrees C. The majority of Cu was found close to substitutional sites, however, with a significant displacement, most likely 0.50(8) A along the <111> directions towards the bond center position. The activation energy for the dissociation of near-substitutional Cu is estimated to be 1.8-2.2 eV.
authors.affiliation: Instituut voor Kern- en Stralingsfysica, University of Leuven, Celestijnenlaan 200 D, B-3001 Leuven, Belgium.
authors.initials: U
authors.lastname: Wahl
authors.initials: A
authors.lastname: Vantomme
authors.initials: G
authors.lastname: Langouche
authors.initials: JG
authors.lastname: Correia