Dynamic scaling in a ballistic deposition model for a binary system
A ballistic deposition model for the kinetics of surface growth for two species is introduced as a description of the evolution of a surface under vapor deposition. We used a tunable parameter P to control the deposition of the particles such that one type is deposited with probability P while the other is deposited with 1-P. Simulations in 2+1 dimensions using local surface diffusion lead to the formation of a rough surface whose dynamical evolution is not that of the Kardar-Parisi-Zhang universality class. Also, when surface diffusion becomes dominant, the model moves away from the Edwards-Wilkinson universality.
El-Nashar
HF
Department of Physics, Faculty of Science, Ain Shams University, 11566 Cairo, Egypt and The Abdus Salam International Centre for Theoretical Physics, P.O. Box 586, 34100 Trieste, Italy.
Cerdeira
HA