Additive fabrication and the mechanisms of nucleation and growth in chemical vapor deposition processes.
In this Account, we present several representative studies of thin-film growth by chemical vapor deposition, with particular emphasis given to elucidating the mechanistic, energetic, and structural aspects of nucleation and growth. These understandings have allowed us to develop new methods to deposit patterned, as opposed to blanket, thin films. We show how such procedures can be exploited to effect the directed assembly (i.e., the additive fabrication) of a device architecture.
Crane
E L
EL
School of Chemical Sciences and Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, USA.
Girolami
G S
GS
Nuzzo
R G
RG
D000535:Aluminum / Q000737:chemistry; D005740:Gases / Q000737:chemistry*; D008855:Microscopy, Electron, Scanning; D010984:Platinum / Q000737:chemistry; D013057:Spectrum Analysis / Q000379:methods; D013696:Temperature
D005740:Gases; D010984:Platinum; D000535:Aluminum