title: Quantitative TEM of point defects in Si
abstract: We review the use of transmission electron microscopy (TEM) to provide a quantitative measurement of both vacancy and interstitial clusters in ion-implanted silicon. Interstitials agglomerate into rod-like defects on 131I) planes, and the evaporation of these defects can be directly correlated to the diffusion enhancements observed during annealing of ion-damaged silicon. Vacancy clusters are easily detected in TEM once they have been labelled using a Au-diffusion technique. The combination of the two approaches provides a quantitative test for models of implantation and annealing in silicon. Detailed models for point defect behaviour, which include Ostwald-ripening and the surface recombination velocity, reproduce all of the crucial features of the observed defect annealing.
authors: Bell Labs, Lucent Technologies, Murray Hill, NJ 07974, USA.
authors: DJ
authors: Eaglesham
authors: VC
authors: Venezia
authors: HJ
authors: Gossmann
authors: A
authors: Agarwal