title: Is ion sputtering always a "negative homoepitaxial deposition"?
abstract: We present a scanning tunneling microscopy study of the direct comparison between homoepitaxial deposition and surface ion sputtering on the Ag(001) system. At a temperature of 200 K, sputtering results in mound formation similar to the epitaxy case, while at higher temperatures an erosive regime sets in with the appearance of regular square pits. Contrary to the conventional wisdom, which considers ion sputtering as a deposition of vacancies, the analysis of single ion impact events reveals that the process produces both adatom and vacancy clusters. The key parameter determining the temperature dependence of surface morphology turns out to be the mobility of the adatom clusters which exceeds that of vacancy clusters.
authors.affiliation: INFM-Unità di Ricerca di Genova, Centro CFSBT-CNR and Dipartimento di Fisica, Via Dodecaneso 33, I-16146 Genova, Italy.
authors.forename: G
authors.initials: G
authors.lastname: Costantini
authors.forename: F
authors.initials: F
authors.lastname: Buatier de Mongeot
authors.forename: C
authors.initials: C
authors.lastname: Boragno
authors.forename: U
authors.initials: U
authors.lastname: Valbusa