Gas chromatographic analysis of trace gas impurities in tungsten hexafluoride.
Highly reactive fluorinated gaseous matrices require special equipment and techniques for the gas chromatographic analysis of trace impurities in these gases. The impurities that were analysed at the low-microg/l levels included oxygen, nitrogen, carbon dioxide, carbon monoxide, sulfur hexafluoride and hydrogen. This paper describes the use of a system utilising backflush column switching to protect the columns and detectors in the analysis of trace gas impurities in tungsten hexafluoride. Two separate channels were used for the analysis of H2, O2, N2, CO, CO2 and SF6 impurities with pulsed discharge helium ionisation detection.
Laurens
J B
JB
Department of Chemical Pathology, University of Pretoria, South Africa. jlaurens@medic.up.ac.za
de Coning
J P
JP
Swinley
J M
JM
D002138:Calibration; D002849:Chromatography, Gas / Q000295:instrumentation / Q000379:methods*; D005740:Gases / Q000032:analysis*; D017973:Tungsten Compounds / Q000737:chemistry*
D005740:Gases; D017973:Tungsten Compounds