Nanofabrication: conventional and nonconventional methods.
Nanofabrication is playing an ever increasing role in science and technology on the nanometer scale and will soon allow us to build systems of the same complexity as found in nature. Conventional methods that emerged from microelectronics are now used for the fabrication of structures for integrated circuits, microelectro-mechanical systems, microoptics and microanalytical devices. Nonconventional or alternative approaches have changed the way we pattern very fine structures and have brought about a new appreciation of simple and low-cost techniques. We present an overview of some of these methods, paying particular attention to those which enable large-scale production of lithographic patterns. We preface the review with a brief primer on lithography and pattern transfer concepts. After reviewing the various patterning techniques, we discuss some recent application issues in the fields of microelectronics, optoelectronics, magnetism as well as in biology and biochemistry.
Chen
Y
Y
Laboratoire de Microstructures et de Microélectronique, CNRS, Bagneux, France. yong.chen@l2m.cnrs.fr
Pépin
A
A
D020811:Biomedical Technology; D017076:Computer-Aided Design; D001330:Electronic Data Processing / Q000295:instrumentation / Q000379:methods; D004581:Electronics / Q000295:instrumentation / Q000379:methods; D004583:Electrons; D007477:Ions; D008280:Magnetics; D008846:Micromanipulation; D008904:Miniaturization / Q000295:instrumentation / Q000379:methods; D020411:Oligonucleotide Array Sequence Analysis; D055095:Optics and Photonics; D012212:Rheology; D012666:Semiconductors; D012825:Silicon; D013499:Surface Properties; D013672:Technology / Q000295:instrumentation / Q000379:methods; D014466:Ultraviolet Rays; D014965:X-Rays
D007477:Ions; D012825:Silicon