title: Entangled-state lithography: tailoring any pattern with a single state.
abstract: We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binomial states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a (N+1) x (N+1) grid, occupying a square with the side half a wavelength long, can be generated from a 2N-photon state.
authors.affiliation: Departamento de Optica, Facultad de Ciencias Físicas, Universidad Complutense, 28040 Madrid, Spain. gunnarb@ele.kth.se
authors.forename: G
authors.initials: G
authors.lastname: Björk
authors.forename: L L
authors.initials: LL
authors.lastname: Sánchez-Soto
authors.forename: J
authors.initials: J
authors.lastname: Söderholm