title: Nanometric patterning of zinc by optical near-field photochemical vapour deposition.
abstract: A new technique, optical near-field photochemical vapour deposition (NFO-PCVD) enables maskless production of nanometric structures with controllable size, chemical composition and morphology. By placing a near-field optical microscope inside the reaction chamber for photochemical vapour deposition we have deposited nanoscale metal patterns. We demonstrate for the first time, successfully deposited in the near-field region, lines of metallic zinc with the observed stripe width of 20 nm.
authors.affiliation: Department of Applied Electronics, Tokyo Institute of Technology, Yokohama, Japan.
authors.forename: V V
authors.initials: VV
authors.lastname: Polonski
authors.forename: Y
authors.initials: Y
authors.lastname: Yamamoto
authors.forename: M
authors.initials: M
authors.lastname: Kourogi
authors.forename: H
authors.initials: H
authors.lastname: Fukuda
authors.forename: M
authors.initials: M
authors.lastname: Ohtsu