Nanometric patterning of zinc by optical near-field photochemical vapour deposition.
A new technique, optical near-field photochemical vapour deposition (NFO-PCVD) enables maskless production of nanometric structures with controllable size, chemical composition and morphology. By placing a near-field optical microscope inside the reaction chamber for photochemical vapour deposition we have deposited nanoscale metal patterns. We demonstrate for the first time, successfully deposited in the near-field region, lines of metallic zinc with the observed stripe width of 20 nm.
Polonski
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VV
Department of Applied Electronics, Tokyo Institute of Technology, Yokohama, Japan.
Yamamoto
Y
Y
Kourogi
M
M
Fukuda
H
H
Ohtsu
M
M