Thickness measurement of thin dielectric films by evanescent total reflection fluorescence.
The electric field of an evanescent wave generates fluorescence in the interface between a dielectric surface and an adjacent, fluorescing, medium of lower refractive index. The difference between the fluorescing signals from covered and noncovered surfaces enables nondestructive measurement of the film thickness to be made in the range 1-15 nm.
Benesová
M
M
Faculty of Mechanical Engineering, Institute of Physics, Brno University of Technology, Czech Republic.
Tománek
P
P