Entangled-state lithography: tailoring any pattern with a single state.
We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binomial states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a (N+1) x (N+1) grid, occupying a square with the side half a wavelength long, can be generated from a 2N-photon state.
Björk
G
G
Departamento de Optica, Facultad de Ciencias Físicas, Universidad Complutense, 28040 Madrid, Spain. gunnarb@ele.kth.se
Sánchez-Soto
L L
LL
Söderholm
J
J