title: An allyltitanium derived from acrolein 1,2-dicyclohexylethylene acetal and (eta(2)-propene)Ti(O-i-Pr)(2) as a chiral propionaldehyde homoenolate equivalent that reacts with imines with excellent stereoselectivity. An efficient and practical access to optically active gamma-amino carbonyl compounds.
abstract: A chiral allyltitanium compound 2, prepared in situ by the reaction of optically active acrolein 1,2-dicyclohexylethylene acetal (3) with (eta(2)-propene)Ti(O-i-Pr)(2) (1), reacts with a variety of acyclic and cyclic imines 4 in a regiospecific way to afford alpha-addition products 5 as a mixture of the E- and Z-isomers in good combined yield, where the former is predominant in a ratio of 92:8 to >95:5. The mixture of (E)- and (Z)-5 and pure (E)-5 which could be isolated in several cases were respectively converted to the corresponding beta-amino ester 6 to confirm the absolute configuration and enantiomeric purity. The ee of the newly formed asymmetric center of 5 is more than 78% for the mixture of (E)- and (Z)-5 and more than 96% for pure (E)-5. By taking advantage of the versatility of the vinyl ether moiety in 5, optically active gamma-amino aldehydes 8, gamma-amino aldehyde acetals 7 and 10, gamma-amino acids 9, beta-amino esters 6, and pyrrolidinoisoquinolines 12 were readily prepared. In the reaction of 2 with optically active alpha-silyloxyimine 4n, remarkable double stereodifferentiation was observed; thus, the reaction of 2 derived from (S,S)- or (R,R)-3 provided syn- and anti-5n in a ratio of 55:45 or 0:100, respectively. Meanwhile, the stereochemistry of the product in the reaction of 2 with beta-silyloxyimine 4o was controlled mainly by 2. Thus, the reaction of beta-silyloxyimine 14 with 2 derived from 1 and (R,R)-3 afforded gamma-silyloxyimine 15 with 92% diastereoselectivity, from which 4-amino-6-hydroxypentadecanal dimethyl acetal (13), a key intermediate for the synthesis of batzelladine D, was synthesized.
authors.affiliation: Department of Biomolecular Engineering, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama, Kanagawa 226-8501, Japan.
authors.forename: S
authors.initials: S
authors.lastname: Okamoto
authors.forename: X
authors.initials: X
authors.lastname: Teng
authors.forename: S
authors.initials: S
authors.lastname: Fujii
authors.forename: Y
authors.initials: Y
authors.lastname: Takayama
authors.forename: F
authors.initials: F
authors.lastname: Sato