Selective-resputtering-induced perpendicular magnetic anisotropy in amorphous TbFe films.
Perpendicular magnetic anisotropy energy in rf magnetron sputtered amorphous TbFe films is measured to increase exponentially with pair-order anisotropy induced by the selective resputtering of surface adatoms during film growth.
Harris
V G
VG
Naval Research Laboratory, Washington, DC 20375-5000, USA.
Pokhil
T
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