title: Spatially inhomogeneous development of antiferromagnetism in URu2Si2: evidence from 29Si NMR under pressure.
abstract: From 29Si NMR study, we present evidence for spatially inhomogeneous development of antiferromagnetic (AF) ordering below T(o) = 17.5 K in URu2Si2. In the pressure range between 3.0 and 8.3 kbar, we have observed the 29Si NMR lines arising from the AF region as well as the previously observed 29Si NMR line which correspond to the nonmagnetic region in the sample. The AF volume fraction is enhanced by applied pressure, whereas the magnitude of internal field at the Si site remains constant (910 Oe) up to 8.3 kbar. In the AF region, the ordered moment is about an order of magnitude larger than 0.03 mu(B)/U.
authors.affiliation: Department of Material Science, Himeji Institute of Technology, Kamigori, Ako-gun, Hyogo 678-1297 Japan.
authors.forename: K
authors.initials: K
authors.lastname: Matsuda
authors.forename: Y
authors.initials: Y
authors.lastname: Kohori
authors.forename: T
authors.initials: T
authors.lastname: Kohara
authors.forename: K
authors.initials: K
authors.lastname: Kuwahara
authors.forename: H
authors.initials: H
authors.lastname: Amitsuka