Wet-etched diffractive lenses for hard X-rays.
A method for the fabrication of linear transmission Fresnel zone plates for X-rays in the 8-15 keV photon energy range is presented. The diffractive elements are generated by electron-beam lithography and chemical wet etching of (110)-oriented silicon membrane substrates. Diffractive structures with aspect ratios of more than 30 for 300 nm-wide structures were obtained. The diffraction efficiency of such a lens was measured for 13.3 keV radiation to be 20%.
David
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Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, CH-5232 Villigen-PSI, Switzerland. christian.david@psi.ch
Ziegler
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Nöhammer
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