title: Concentration variability of halocarbons over an electronics industrial park and its implication in compliance with the Montreal protocol.
abstract: This work investigated fugitive emissions of anthropogenic halocarbons in a semiconductor and electronics industrial park in Taiwan using both flask and in-situ measurement methods. Large concentration variabilities in methylchloroform, trichloroethene, and tetrachloroethene suggested substantial usage and emissions in the industrial park. While the variability of CFC-113, CCl4, and CFC-11 was rather small using the flask sampling technique, the in-situ method with its higher frequency, however, showed significantly larger variability arising from observing periodic emission episodes, which were highly correlated with wind direction and topography of the park.
authors.affiliation: Department of Nuclear Science, National Tsing-Hua University, Shin-Chu, Taiwan.
authors.forename: C C
authors.initials: CC
authors.lastname: Chang
authors.forename: G G
authors.initials: GG
authors.lastname: Lo
authors.forename: C H
authors.initials: CH
authors.lastname: Tsai
authors.forename: J L
authors.initials: JL
authors.lastname: Wang
mesh_terms: D000393:Air Pollutants / Q000032:analysis*; D004784:Environmental Monitoring; D019983:Guideline Adherence; D006843:Hydrocarbons, Chlorinated / Q000032:analysis*; D007221:Industry; D012666:Semiconductors; D014919:Wind
chemical_list: D000393:Air Pollutants; D006843:Hydrocarbons, Chlorinated