title: Photocatalytic activity of TiO2 films grown on different substrates.
abstract: Titanium dioxide films were prepared on glass, indium-tin oxide (ITO) glass and p-type monocrystalline silicon and studied for the photocatalytic degradation of rhodamine B in an aqueous medium. Raman, AFM, and XPS spectroscopic investigations of these films indicated that microstructure of titanium oxide films were greatly affected by the substrate materials. Rutile was confirmed to be easily formed on the surface of ITO glass, and TiO2 tended to grow as closely packed particles that were elongated strips with an average size of 20 nm, and had lovely contrast with the perfectly round particles grown on p-type monocrystalline silicon. Charge transfer between the film and silicon substrate was verified by surface photovoltage spectra. This may be the real reason why the films grown on ITO glass and silicon substrates exhibit higher photocatalytic reactivity than the film on glass substrate. Moreover, the different surface properties also seem to be responsible for the different activity.
authors.affiliation: Center for Molecular Science, Institute of Chemistry, Chinese Academy of Sciences, Beijing, People's Republic of China.
authors.forename: Y
authors.initials: Y
authors.lastname: Ma
authors.forename: J B
authors.initials: JB
authors.lastname: Qiu
authors.forename: Y A
authors.initials: YA
authors.lastname: Cao
authors.forename: Z S
authors.initials: ZS
authors.lastname: Guan
authors.forename: J N
authors.initials: JN
authors.lastname: Yao
mesh_terms: D002384:Catalysis; D004563:Electrochemistry; D005456:Fluorescent Dyes / Q000737:chemistry*; D005898:Glass; D010777:Photochemistry; D017319:Photosensitizing Agents / Q000737:chemistry*; D012235:Rhodamines / Q000737:chemistry*; D012825:Silicon; D014025:Titanium / Q000737:chemistry*
chemical_list: D005456:Fluorescent Dyes; D017319:Photosensitizing Agents; D012235:Rhodamines; C009495:titanium dioxide; D014025:Titanium; C029773:rhodamine B; D012825:Silicon