title: Development of multipurpose laboratory XIEES spectrometer and its application to surface XAFS analysis of Al2O3 films.
abstract: A new laboratory spectrometer for X-ray Induced Electron Emission Spectroscopy (XIEES) has been developed. This spectrometer is suitable for measurements of X-ray Absorption Fine Structure (XAFS) spectrum in surface sensitive fluorescence and electron emission detection modes as well as in standard transmission mode. It is the advantage of this spectrometer that a wide range of x-ray energy scanning between 0.48 and 41 keV is available. At the Cu K-edge, a energy resolution of about 2 eV has been achieved. The spectrometer has been used to analyze the Al2O3 (40 A and 500 A)/Si(100) with total electron yield measurement.
authors.affiliation: TCS Center, Samsung Advanced Institute of Technology, Suwon, Korea. cheol@sait.samsung.co.kr
authors.forename: J C
authors.initials: JC
authors.lastname: Lee
authors.forename: S A
authors.initials: SA
authors.lastname: Song
authors.forename: Y
authors.initials: Y
authors.lastname: Yuryev
authors.forename: Y
authors.initials: Y
authors.lastname: Terada
authors.forename: I
authors.initials: I
authors.lastname: Nakai
authors.forename: C B
authors.initials: CB
authors.lastname: Lim