Absolute extreme ultraviolet yield from femtosecond-laser-excited Xe clusters.
Large Xe clusters (10(5)-10(6) atoms per cluster) have been irradiated with ultrashort (50 fs) and high-intensity ( approximately 2 x 10(18) W/cm(2)) pulses from a Ti:sapphire multi-TW laser at 800 nm wavelength. Scaling and absolute yield measurements of extreme ultraviolet (EUV) emission in a wavelength range between 7 and 15 nm in combination with cluster target characterization have been used for yield optimization. Maximum emission as a function of the backing pressure and a spatial emission anisotropy covering a factor of two at optimized yields is discussed with a simple model of the source geometry and EUV-radiation absorption. Circularly polarized laser light instead of linear polarization results in a factor of 2.5 higher emission in the 11 to 15 nm wavelength range. This indicates the initial influence of optical-field ionization for the interaction parameter range used and contrasts to collisional heating that seems to influence preferentially higher ionization. Absolute emission efficiency at 13.4 nm of up to 0.5% in 2pi sr and 2.2% bandwidth has been obtained.
Ter-Avetisyan
S
S
Max-Born-Institut, Max-Born-Strasse 2a, D-12489 Berlin, Germany and Institute for Physical Research, Ashtarak-2, 378410, Armenia.
Schnürer
M
M
Stiel
H
H
Vogt
U
U
Radloff
W
W
Karpov
W
W
Sandner
W
W
Nickles
P V
PV
D016880:Anisotropy; D007477:Ions; D007834:Lasers; D055585:Physical Phenomena; D010825:Physics; D011312:Pressure; D013997:Time Factors; D014466:Ultraviolet Rays; D014978:Xenon
D007477:Ions; D014978:Xenon