title: Minute SiGe quantum dots on Si(001) by a kinetic 3D island mode.
abstract: We investigated the initial growth stages of Si(x)Ge(1-x)/Si(001) by real time stress measurements and in situ scanning tunneling microscopy at deposition temperatures, where intermixing effects are still minute (< or =900 K). Whereas Ge/Si(001) is a well known Stranski-Krastanow system, the growth of SiGe alloy films switches to a 3D island mode at Si content above 20%. The obtained islands are small (a few nanometers), are uniform in shape, and exhibit a narrow size distribution, making them promising candidates for future quantum dot devices.
authors.affiliation: Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5-7, D-10117 Berlin, Germany.
authors.forename: R
authors.initials: R
authors.lastname: Koch
authors.forename: G
authors.initials: G
authors.lastname: Wedler
authors.forename: J J
authors.initials: JJ
authors.lastname: Schulz
authors.forename: B
authors.initials: B
authors.lastname: Wassermann