title: Morphology transition during low-pressure chemical vapor deposition.
abstract: Assuming a reemission model, we have studied, in detail, the effect of sticking coefficient on the morphology evolution in low-pressure chemical vapor deposition processes. We have shown that the surface morphology changes from a self-affine fractal to a columnarlike morphology with increasing sticking coefficient, which agrees qualitatively with experimental observations.
authors.affiliation: Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180-3590, USA.
authors.forename: Y P
authors.initials: YP
authors.lastname: Zhao
authors.forename: J T
authors.initials: JT
authors.lastname: Drotar
authors.forename: G C
authors.initials: GC
authors.lastname: Wang
authors.forename: T M
authors.initials: TM
authors.lastname: Lu