title: Direct determination of track etch rate and response of CR-39 to normal incidence high-energy heavy ions.
abstract: Response of CR-39 to high-energy heavy ions was investigated by using optical microphotographs of track profiles for Ar (480 MeV/n) and Ni (300 MeV/n). The depth dependence of track etch rate (VT) was determined experimentally by track length measurement. The results indicate that VT for the low REL Ar tracks is depth independent but for the high REL Ni tracks VT is gradually decreasing with depth. The region beyond 30 m depth inside the detector shows a stable region regarding the detector response for both ions.
authors.affiliation: Physics Department, Faculty of Science, Menoufia University, Shebin El-Koom, Egypt. el-sayedawad@usa.net
authors.forename: E M
authors.initials: EM
authors.lastname: Awad
mesh_terms: D001128:Argon; D002244:Carbon; D003359:Cosmic Radiation; D006046:Gold; D020450:Heavy Ions; D009532:Nickel; D009584:Nitrogen; D011092:Polyethylene Glycols; D011874:Radiometry; D013997:Time Factors
chemical_list: C028827:CR 39; D011092:Polyethylene Glycols; D001128:Argon; D002244:Carbon; D006046:Gold; D009532:Nickel; D009584:Nitrogen