title: Dewar benzene as a protecting group? Demonstration of photolithographic crystallization.
abstract: The concept of Dewar benzene as a supramolecular protecting group for solid-state aryl-aryl interactions is reported. Photoisomerization of 1,4,5,6-tetramethyl-bicyclo[2.2.0]hexa-2,5-diene-2,3-dicarboxylic acid dimethyl ester (1) to the corresponding benzene isomer proceeds with rapid crystal formation. Herein this property is applied to the photolithographic patterning of crystal domains on a surface. [structure: see text]
authors.affiliation: Department of Chemistry, University of California at Riverside, Riverside, CA 92521-0403, USA. michael.marsella@ucr.edu
authors.forename: M J
authors.initials: MJ
authors.lastname: Marsella
authors.forename: M M
authors.initials: MM
authors.lastname: Meyer
authors.forename: F S
authors.initials: FS
authors.lastname: Tham