Dewar benzene as a protecting group? Demonstration of photolithographic crystallization.
The concept of Dewar benzene as a supramolecular protecting group for solid-state aryl-aryl interactions is reported. Photoisomerization of 1,4,5,6-tetramethyl-bicyclo[2.2.0]hexa-2,5-diene-2,3-dicarboxylic acid dimethyl ester (1) to the corresponding benzene isomer proceeds with rapid crystal formation. Herein this property is applied to the photolithographic patterning of crystal domains on a surface. [structure: see text]
Marsella
M J
MJ
Department of Chemistry, University of California at Riverside, Riverside, CA 92521-0403, USA. michael.marsella@ucr.edu
Meyer
M M
MM
Tham
F S
FS