title: Construction of mixed mercaptopropionic acid/alkanethiol monolayers of controlled composition by structural control of a gold substrate with underpotentially deposited lead atoms.
abstract: Mixed monolayers of 3-mercaptopropionic acid (MPA) and alkanethiols of various chain lengths have been constructed on Au based on a novel concept, namely, control of the composition of the component thiols in mixed monolayers by controlling the surface structure of the substrate. The Au substrate surface was first modified with underpotentially deposited Pb (UPD Pb) atoms, followed by the formation of a self-assembled monolayer (SAM) of alkanethiol. The UPD Pb atoms were then oxidatively stripped from the surface to create vacant site, on which MPA was adsorbed to finally form the mixed monolayers. The surface coverages of Pb, alkanethiol and MPA, and the total numbers of thiols were determined using an electrochemical quartz crystal microbalance, X-ray photoelectron spectroscopy, and reductive desorption voltammetry. These results demonstrate that the surface coverage of MPA in the mixed monolayers is determined by the initial coverage of UPD Pb. Fourier transform infrared spectra also support this conclusion. The observed single peak in the cyclic voltammogram for the reductive desorption shows that MPA and alkanethiol do not form their single-component domains. Scanning tunneling microscopy revealed the single-row pinstripe structure for all the thiol adlayers formed during each step of the preparation. This shows that the surface structure of the mixed monolayers is determined by the structure of the initially formed SAM on Au partially covered with UPD Pb.
authors.affiliation: Division of Material Science, Graduate School of Environmental Earth Science, Hokkaido University, Sapporo 060-0810, Japan. shimazu@ees.hokudai.ac.jp
authors.forename: Katsuaki
authors.initials: K
authors.lastname: Shimazu
authors.forename: Toshikazu
authors.initials: T
authors.lastname: Kawaguchi
authors.forename: Takao
authors.initials: T
authors.lastname: Isomura