Biocompatible photolithographic process for the patterning of biomolecules.
A new approach for the patterning of biomolecule layers is introduced based on the design of a new photoresist material with biocompatible lithographic processing requirements. The photoresist is based on poly(t-butyl acrylate), which allows positive imaging with very dilute basic solutions, tolerable by selected biomolecules used in immunoanalysis. Sensitivity at lambda>300 nm is obtained using a suitable sulfonium salt photoacid generator. Thermal steps also take place under conditions tolerable by biomolecules. Lithographic results on Si wafer substrates show resolution capabilities for equal lines/spaces, down to the range of 5-10 microm under biocompatible conditions. The process is also used on substrates of different geometries, including inner capillary surfaces. The patterning of the inner surface of a polystyrene capillary with mouse IgG is reported to demonstrate the principles of the above approach.
Douvas
Antonios
A
Institute of Microelectronics, NCSR Demokritos, 15310, Aghia Paraskevi, Greece.
Argitis
Panagiotis
P
Misiakos
Konstantinos
K
Dimotikali
Dimitra
D
Petrou
Panagiota S
PS
Kakabakos
Sotirios E
SE
D000818:Animals; D020099:Coated Materials, Biocompatible / Q000737:chemistry*; D005240:Feasibility Studies; D007118:Immunoassay / Q000295:instrumentation* / Q000379:methods*; D007074:Immunoglobulin G / Q000032:analysis; D051379:Mice; D008956:Models, Chemical; D036103:Nanotechnology; D010781:Photography / Q000295:instrumentation* / Q000379:methods*; D011137:Polystyrenes; D012680:Sensitivity and Specificity; D013499:Surface Properties
D020099:Coated Materials, Biocompatible; D007074:Immunoglobulin G; D011137:Polystyrenes