X-ray multilayer monochromator with enhanced performance.
An x-ray multilayer monochromator with improved resolution and a low specular background is presented. The monochromator consists of a lamellar multilayer amplitude grating with appropriate parameters used at the zeroth diffraction order. The device is fabricated by means of combining deposition of thin films on a nanometer scale, UV lithography, and reactive ion etching. The performance of this new monochromator at photon energies near 1500 eV is shown.
André
Jean-Michel
JM
Laboratoire de Chimie Physique, Matière et Rayonnement, Université Pierre et Marie Curie, Centre National de la Recherche Scientifique, Unité Mixte de Recherche 7416, Paris, France. andrejm@ccr.jussieu.fr
Benbalagh
Rabah
R
Barchewitz
Robert
R
Ravet
Marie-Françoise
MF
Raynal
Alain
A
Delmotte
Frank
F
Bridou
Françoise
F
Julié
Gwénäelle
G
Bosseboeuf
Alain
A
Laval
René
R
Soullié
Gérard
G
Rémond
Christian
C
Fialin
Michel
M