Reaction kinetics of diffusing particles injected into a reactive substrate.
We analyze the kinetics of trapping (A+B-->B) and annihilation (A+B-->0) processes on a one-dimensional substrate with homogeneous distribution of immobile B particles while the A particles are supplied by a localized source. For the imperfect reaction case, we analyze both problems by means of a stochastic model and compare the results with numerical simulations. In addition, we present the exact analytical results of the stochastic model for the case of perfect trapping.
Sánchez
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Centro Atómico Bariloche (CNEA) and Instituto Balseiro (CNEA and UNC), 8400-San Carlos de Bariloche, Argentina. sanchez@cab.cnea.gov.ar
Bouzat
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