Observation of columnar microstructure in step-graded Si1-xGex/Si films using high-resolution X-ray microdiffraction.
Columnar microstructure in step-graded Si(1-x)Ge(x)/Si(001) structures with low threading dislocation densities has been determined using high angular resolution (approximately 0.005 degrees ) x-ray microdiffraction. X-ray rocking curves of a 3-microm-thick strain-relaxed Si(0.83)Ge(0.17) film show many sharp peaks and can be simulated with a model having a set of Gaussians having narrow angular widths (0.013 degrees -0.02 degrees ) and local ranges of tilt angles varying from 0.05 degrees to 0.2 degrees. These peaks correspond to individual tilted rectangular columnar micrograins having similar (001) lattice spacings and average areas of 0.8 to 2.0 microm(2).
Eastman
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James Franck Institute, University of Chicago, 5640 S. Ellis Avenue, Chicago, Illinois 60637, USA.
Stagarescu
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Xu
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Mooney
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Jordan-Sweet
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Lai
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Cai
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