title: Development of a multilayer Fresnel zone plate for high-energy synchrotron radiation X-rays by DC sputtering deposition.
abstract: Hard X-ray microscopy with high spatial resolution (<or=0.1 microm) using a high-energy and high-brilliance X-ray microprobe is expected to be a promising technology for various types of analysis, imaging etc. in materials science, biology and medicine. A multilayer Fresnel zone plate (FZP) could be a promising approach to focusing optics in the high-energy X-ray region (>or=20 keV) because a large thickness (aspect ratio) can be available. Various types of multilayer FZPs have been fabricated by DC sputtering deposition. Their focusing characteristics have been evaluated at the high-brilliance undulator beamline BL47XU of SPring-8. An optical system using a Cu/Al multilayer FZP (with an outermost zone width of 0.25 microm) as the focusing optics fabricated by the optimum deposition condition with precise film (zone) thickness control has attained an almost diffraction-limited microbeam of 0.3-0.35 microm at 8.9 keV. A line-and-space resolution test pattern has been observed: fine structures up to 0.2 microm were clearly observed in the measured image. This FZP has been working since 1995, keeping good focusing characteristics. It can be said from these results that a spatial resolution better than 0.1 microm in the high-energy X-ray region is in prospect by the development of a multilayer FZP with a narrower outermost zone width in the near future.
authors.affiliation: Photonics Research Institute, AIST Kansai, National Institute of Advanced Industrial Science and Technology (AIST), 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan. sg-tamura@aist.go.jp
authors.forename: S
authors.initials: S
authors.lastname: Tamura
authors.forename: M
authors.initials: M
authors.lastname: Yasumoto
authors.forename: N
authors.initials: N
authors.lastname: Kamijo
authors.forename: Y
authors.initials: Y
authors.lastname: Suzuki
authors.forename: M
authors.initials: M
authors.lastname: Awaji
authors.forename: A
authors.initials: A
authors.lastname: Takeuchi
authors.forename: H
authors.initials: H
authors.lastname: Takano
authors.forename: K
authors.initials: K
authors.lastname: Handa