title: Effect of systematic errors in spectral photometric data on the accuracy of determination of optical parameters of dielectric thin films.
abstract: The determination of optical parameters of thin films from experimental data is a typical task in the field of optical-coating technology. The optical characterization of a single layer deposited on a substrate with known optical parameters is widely used for this purpose. Results of optical characterization are dependent on not only the choice of the thin-film model but also on the quality of experimental data. The theoretical results presented highlight the effect of systematic errors in measurement data on the determination of thin-film parameters. Application of these theoretical results is illustrated by the analysis of experimental data for magnesium fluoride thin films.
authors: Research Computing Center, Moscow State University, Vorob'evy Gory, Russia. tikh@tikh.srcc.msu.su
authors: Alexander V
authors: AV
authors: Tikhonravov
authors: Michael K
authors: MK
authors: Trubetskov
authors: Michael A
authors: MA
authors: Kokarev
authors: Tatiana V
authors: TV
authors: Amotchkina
authors: Angela
authors: A
authors: Duparré
authors: Etienne
authors: E
authors: Quesnel
authors: Detlev
authors: D
authors: Ristau
authors: Stefan
authors: S
authors: Günster