title: Development of optical coatings for 157-nm lithography. II. Reflectance, absorption, and scatter measurement.
abstract: The total loss that can be suffered by an antireflection (AR) coating consists of reflectance loss, absorption loss, and scatter loss. To separate these losses we developed a calorimetric absorption measurement apparatus and an ellipsoidal Coblentz hemisphere based scatterometer for 157-nm optics. Reflectance, absorption, and scatter of AR coatings were measured with these apparatuses. The AR coating samples were supplied by Japanese vendors. Each AR coating as supplied was coated with the vendor's coating design by that vendor's coating process. Our measurement apparatuses, methods, and results for these AR coatings are presented here.
authors.affiliation: Association of Super-Advanced Electronics Technologies, Hiratsuka Kanagawa, Japan. otani.minoru@canon.co.jp
authors.forename: Minoru
authors.initials: M
authors.lastname: Otani
authors.forename: Ryuji
authors.initials: R
authors.lastname: Biro
authors.forename: Chidane
authors.initials: C
authors.lastname: Ouchi
authors.forename: Masanobu
authors.initials: M
authors.lastname: Hasegawa
authors.forename: Yasuyuki
authors.initials: Y
authors.lastname: Suzuki
authors.forename: Kazuho
authors.initials: K
authors.lastname: Sone
authors.forename: Shunsuke
authors.initials: S
authors.lastname: Niisaka
authors.forename: Tadahiko
authors.initials: T
authors.lastname: Saito
authors.forename: Jun
authors.initials: J
authors.lastname: Saito
authors.forename: Akira
authors.initials: A
authors.lastname: Tanaka
authors.forename: Akira
authors.initials: A
authors.lastname: Matsumoto