title: Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system.
abstract: We present our results of coating a first set of optical elements for an extreme-ultraviolet (EUV) lithography system. The optics were coated with Mo-Si multilayer mirrors by dc magnetron sputtering and characterized by synchrotron radiation. Near-normal incidence reflectances above 65% were achieved at 13.35 nm. The run-to-run reproducibility of the reflectance peak wavelength was maintained to within 0.4%, and the thickness uniformity (or gradient) was controlled to within +/-0.05% peak to valley, exceeding the prescribed specification. The deposition technique used for this study is an enabling technology for EUV lithography, making it possible to fabricate multilayer-coated optics to accuracies commensurate with atomic dimensions.
authors.affiliation: Information Science and Technology, Lawrence Livermore National Laboratory, Livermore, California 94551, USA. cmontcalm@veeco.com
authors.forename: Claude
authors.initials: C
authors.lastname: Montcalm
authors.forename: R Frederick
authors.initials: RF
authors.lastname: Grabner
authors.forename: Russell M
authors.initials: RM
authors.lastname: Hudyma
authors.forename: Mark A
authors.initials: MA
authors.lastname: Schmidt
authors.forename: Eberhard
authors.initials: E
authors.lastname: Spiller
authors.forename: Christopher C
authors.initials: CC
authors.lastname: Walton
authors.forename: Marco
authors.initials: M
authors.lastname: Wedowski
authors.forename: James A
authors.initials: JA
authors.lastname: Folta