Atomic-precision multilayer coating of the first set of optics for an extreme-ultraviolet lithography prototype system.
We present our results of coating a first set of optical elements for an extreme-ultraviolet (EUV) lithography system. The optics were coated with Mo-Si multilayer mirrors by dc magnetron sputtering and characterized by synchrotron radiation. Near-normal incidence reflectances above 65% were achieved at 13.35 nm. The run-to-run reproducibility of the reflectance peak wavelength was maintained to within 0.4%, and the thickness uniformity (or gradient) was controlled to within +/-0.05% peak to valley, exceeding the prescribed specification. The deposition technique used for this study is an enabling technology for EUV lithography, making it possible to fabricate multilayer-coated optics to accuracies commensurate with atomic dimensions.
Montcalm
Claude
C
Information Science and Technology, Lawrence Livermore National Laboratory, Livermore, California 94551, USA. cmontcalm@veeco.com
Grabner
R Frederick
RF
Hudyma
Russell M
RM
Schmidt
Mark A
MA
Spiller
Eberhard
E
Walton
Christopher C
CC
Wedowski
Marco
M
Folta
James A
JA