Fabrication of a nano-scale gap by selective chemical deposition.
An electrode nanogap of 45 nm has been prepared by a new method in which the initial gap of 1-2 microns obtained by conventional lithography was shortened by selective chemical deposition of copper onto the electrodes.
National Laboratory of Molecular and Biomolecular Electronics, Southeast University, Nanjing 210096, People's Republic of China. huanglan822@yahoo.com
Lan
L
Huang
Lina
L
Xu
Haiqin
H
Zhang
Ning
N
Gu