title: Bulk etching rate of LR115 detectors.
abstract: The thickness of the layer of LR115 detector removed during etching was measured with a very precise instrument. Dependence of the bulk etch rate on temperature of the etching solution was investigated. It has been found that the etch rate is (3.27 +/- 0.08) microm/h at 60 degrees C in 10%NaOH of water solution. It was also found that the track density in the detector irradiated to radon and its progeny increases linearly with the removed layer.
authors.affiliation: Faculty of Science, Department of Physics, Kragujevac, Yugoslavia. nikezic@knez.uis.kg.ac.yu
authors.forename: D
authors.initials: D
authors.lastname: Nikezić
authors.forename: A
authors.initials: A
authors.lastname: Janićijević