title: Effect of an atomically thin dielectric film on the surface electron dynamics: image-potential states in the Ar/Cu(100) system.
abstract: The effect of an atomically thin Ar layer on the image-potential states on Cu(100) surfaces is studied in a joint experimental-theoretical study, allowing a detailed analysis of the interaction between a surface electron and a thin insulator layer. A microscopic theoretical description of the Ar layer is developed based on mutually polarizing Ar atoms. Account of the 3D Ar layer structure allows one to predict energies and lifetimes of the image states in excellent agreement with the observations. The Ar layer, even as thin as one monolayer, is efficiently insulating the state from the metal.
authors.affiliation: Laboratoire des Collisions Atomiques et Moléculaires, UMR CNRS-Université Paris-Sud 8625, Bâtiment 351, Université Paris-Sud, 91405 Orsay Cedex, France.
authors.forename: D C
authors.initials: DC
authors.lastname: Marinica
authors.forename: C
authors.initials: C
authors.lastname: Ramseyer
authors.forename: A G
authors.initials: AG
authors.lastname: Borisov
authors.forename: D
authors.initials: D
authors.lastname: Teillet-Billy
authors.forename: J P
authors.initials: JP
authors.lastname: Gauyacq
authors.forename: W
authors.initials: W
authors.lastname: Berthold
authors.forename: P
authors.initials: P
authors.lastname: Feulner
authors.forename: U
authors.initials: U
authors.lastname: Höfer