Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror.
An elliptical mirror for X-ray microfocusing was manufactured using the new fabrication methods of elastic emission machining and plasma chemical vaporization machining. Surface profiles measured using stitching interferometry showed a maximum deviation around the ideal figure of 7 nm peak-to-valley. The mirror showed nearly diffraction-limited focusing performance, with a 200 nm line width at the focus. Wave-optical calculations, taking the measured surface profile into consideration, reproduced well the measured focusing properties both at and around the beam waist.
Department of Precision Science, Osaka University, Yamada-Oka 2-1, Suita, Osaka 565-0871, Japan. yamauchi@prec.eng.osaka-u.ac.jp
Kazuto
K
Yamauchi
Kazuya
K
Yamamura
Hidekazu
H
Mimura
Yasuhisa
Y
Sano
Akira
A
Saito
Alexei
A
Souvorov
Makina
M
Yabashi
Kenji
K
Tamasaku
Tetsuya
T
Ishikawa
Yuzo
Y
Mori