title: A study of positive charge effect on AFM anodization lithography using metal phosphate monolayers.
abstract: Monolayer films of metal phosphate were prepared by sequential adsorption of phosphoric acid (PA) and metal ions (Zr4+ or Ca2+). The monolayer formation was confirmed and characterized by ellipsometry and atomic force microscopy (AFM). Nanometer-scale patterning on the self-assembled metal phosphate films has been achieved using AFM. The difference in AFM lithography on positively charged surfaces in the case of Zr4+ and Ca2+ ions was investigated and summarized. Since the presence of the positive charges allows electrons to move from a tip to a layer easily, the lithographic process initiates at a lower voltage in the layer of Zr2+ phosphate than in the layer of Ca phosphate or PA. Other lithographic results on metal phosphate layers were compared with those on a monolayer of PA.
authors.affiliation: Department of Chemistry, Hanyang University, Sungdong-ku, Seoul, South Korea.
authors.forename: Sang Min
authors.initials: SM
authors.lastname: Kim
authors.forename: Sang Jung
authors.initials: SJ
authors.lastname: Ahn
authors.forename: Haeseong
authors.initials: H
authors.lastname: Lee
authors.forename: Eung Ryul
authors.initials: ER
authors.lastname: Kim
authors.forename: Haiwon
authors.initials: H
authors.lastname: Lee