title: Experimental persistence probability for fluctuating steps.
abstract: The persistence behavior for fluctuating steps on the Si(111)-(sqrt[3]xsqrt[3])R30 degrees -Al surface was determined by analyzing time-dependent STM images for temperatures between 770 and 970 K. Using the standard persistence definition, the measured persistence probability displays power-law decay with an exponent of theta=0.77+/-0.03. This is consistent with the value of theta=3/4 predicted for attachment-detachment limited step kinetics. If the persistence analysis is carried out in terms of return to a fixed-reference position, the measured probability decays exponentially. Numerical studies of the Langevin equation used to model step motion corroborate the experimental observations.
authors.affiliation: Materials Research Science and Engineering Center, Department of Physics, University of Maryland, College Park, Maryland 20742-4111, USA.
authors.forename: D B
authors.initials: DB
authors.lastname: Dougherty
authors.forename: I
authors.initials: I
authors.lastname: Lyubinetsky
authors.forename: E D
authors.initials: ED
authors.lastname: Williams
authors.forename: M
authors.initials: M
authors.lastname: Constantin
authors.forename: C
authors.initials: C
authors.lastname: Dasgupta
authors.forename: S
authors.initials: S
authors.lastname: Das Sarma