title: Effective insulating properties of autooxidized monolayers using organic ditellurides.
abstract: Dialkyl ditellurides adsorb on Au(111) surfaces by wet deposition to form highly resistive autooxidized monolayers (AMs) due to the automatic formation of oxidized tellurium species after the adsorption of ditellurides on the surfaces under air in contrast to the case of the lighter dichalcogenides such as disulfides and diselenides. The ditelluride AMs could be applied to the selective fabrication of effective resistance, ferroelectric layers, piezoelectric parts, and/or new imaging systems using the feature of tellurium oxide in small device circuits.
authors.affiliation: Nanotechnology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 5-2, 1-1 Higashi 1-Chome, Japan. tohru.nakamura@aist.go.jp
authors.forename: Tohru
authors.initials: T
authors.lastname: Nakamura
authors.forename: Satoshi
authors.initials: S
authors.lastname: Yasuda
authors.forename: Takayuki
authors.initials: T
authors.lastname: Miyamae
authors.forename: Hisakazu
authors.initials: H
authors.lastname: Nozoye
authors.forename: Nobuhiko
authors.initials: N
authors.lastname: Kobayashi
authors.forename: Hiroshi
authors.initials: H
authors.lastname: Kondoh
authors.forename: Ikuyo
authors.initials: I
authors.lastname: Nakai
authors.forename: Toshiaki
authors.initials: T
authors.lastname: Ohta
authors.forename: Daisuke
authors.initials: D
authors.lastname: Yoshimura
authors.forename: Mutsuyoshi
authors.initials: M
authors.lastname: Matsumoto