Additive lithography for fabrication of diffractive optics.
An innovative fabrication technique is introduced that is based on multiple-exposure techniques for micro-optics fabrication. This method utilizes various exposure times and combinations of binary and analog photo masks to sculpture complex photoresist profiles. It also demonstrates the fabrication of analog structures from the multilevel structures thus formed by using resist reflow.
Pitchumani
Mahesh
M
School of Optics/Center for Research and Education in Optics and Lasers, University of Central Florida, Orlando 32816-2700, USA.
Hockel
Heidi
H
Mohammed
Waleed
W
Johnson
Eric G
EG