title: Influence of the composition of BCN films deposited by reactive magnetron sputtering on their properties.
abstract: Compounds of the B--C--N system are very promising to produce superhard coatings with good tribological, chemical, and thermal properties. To investigate the influence of the composition of BCN films on their properties, films with five different compositions at nearly constant nitrogen content were deposited on silicon wafers by magnetron sputtering from hexagonal boron nitride and graphite targets operated in RF and DC mode, respectively. The compositions and binding states of the films were determined by XPS. The nitrogen content was found to be almost constant for all films at about a 40 at-%, whereas boron and carbon compositions ranged between 15-35 and 25-50 at-%, respectively. The electronic and bonding structure of the coatings were analyzed by REELS using three different electron beam energies to obtain information at different depths. An increase of the carbon content of the films resulted in a significant shift of the pi-pi* interband transition with respect to the energy loss corresponding to h-BN. The absence of the pi-pi* transition in the energy loss spectra acquired at a beam energy of 1900 eV indicates the existence of a very thin overlayer mostly sp(2) bonded and probably with a distorted hexagonal structure. The position of the bulk plasmon losses corresponded to the hexagonal phase for the overlayer and presented a shift of more than 1.5 eV to the higher energy loss direction for the spectra obtained at 1900 eV beam energy. This shift and the absence of the sp(2)-bond fingerprint induced the possibility of an underlying disordered structure with a majority of sp(3) bonds.
authors.affiliation: Lehrstuhl für Theoretische Hüttenkunde, Rheinisch-Westfälische Technische Hochschule Aachen, 52056 Aachen, Germany. martinez@mch.rwth-aachen.de
authors.forename: C
authors.initials: C
authors.lastname: Martínez
authors.forename: S
authors.initials: S
authors.lastname: Kyrsta
authors.forename: R
authors.initials: R
authors.lastname: Cremer
authors.forename: D
authors.initials: D
authors.lastname: Neuschütz