title: Additive lithography for fabrication of diffractive optics.
abstract: An innovative fabrication technique is introduced that is based on multiple-exposure techniques for micro-optics fabrication. This method utilizes various exposure times and combinations of binary and analog photo masks to sculpture complex photoresist profiles. It also demonstrates the fabrication of analog structures from the multilevel structures thus formed by using resist reflow.
authors.affiliation: School of Optics/Center for Research and Education in Optics and Lasers, University of Central Florida, Orlando 32816-2700, USA.
authors.forename: Mahesh
authors.initials: M
authors.lastname: Pitchumani
authors.forename: Heidi
authors.initials: H
authors.lastname: Hockel
authors.forename: Waleed
authors.initials: W
authors.lastname: Mohammed
authors.forename: Eric G
authors.initials: EG
authors.lastname: Johnson