title: The structure of self-assembled multilayers with polyoxometalate nanoclusters.
abstract: Using electrostatic layer-by-layer self-assembly (ELSA), the formation of multilayers with polyelectrolytes and nanoscopic polyoxometalate (POM) clusters of different sizes and charges is investigated. The multilayers are characterized by UV-vis absorption spectroscopy, optical ellipsometry, cyclic voltammetry, and atomic force microscopy. In all cases, it is possible to find experimental conditions to achieve irreversible adsorption and regular multilayer deposition. Most importantly, the surface coverage is directly related to the total charge of the POM anion and can be controlled from submonolayer to multilayer coverage by adjusting the ionic strength of the dipping solutions. Imaging the interfaces after POM deposition by atomic force microscopy reveals a granular surface texture with nanometer-sized features. The average interfacial roughness amounts to approximately 1 nm. Cyclic voltammetry indicates that the electrochemical properties of the POM clusters are fully maintained in the polyelectrolyte matrix, which opens a route toward practical applications such as sensors or heterogeneous catalysts. Moreover, the permeability toward electrochemically active probe molecules can be tailored through the multilayer architecture and deposition conditions. Finally, we note that despite the low total charge and comparably small size of the discrete POM anions, the multilayers are remarkably stable. This work provides basic guidelines for the assembly of POM-containing ELSA multilayers and provides detailed insight into characteristic surface coverage, permeability, and electrochemical properties.
authors.affiliation: Max Planck Institute of Colloids and Interfaces, D-14424 Potsdam, Germany.
authors.forename: Shaoqin
authors.initials: S
authors.lastname: Liu
authors.forename: Dirk G
authors.initials: DG
authors.lastname: Kurth
authors.forename: Bjoern
authors.initials: B
authors.lastname: Bredenkötter
authors.forename: Dirk
authors.initials: D
authors.lastname: Volkmer